Directed Self-assembly of Block Co-polymers for Nano-manufacturing

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<p>The directed<i></i>self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. <i>Directed self-assembly of Block Co-polymers for Nano-manufacturing </i>reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.</p><p>Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA.<b></b>Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and relate